2026

Ultrafast Laser
Lithography System

A custom-designed galvanometer-based scanning lithography system for nano-scale machining using ultrafast laser pulses.

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Overview

This galvanometer-based scanning lithography system is a versatile ultrafast irradiation platform designed to expand research possibilities for high-power laser processing. The system enables high-precision nano-scale machining with programmable scan trajectories, real-time power modulation, and in-situ sample imaging, all without the cost overhead of commercial lithography platforms.

The design prioritizes modularity and accessibility. Built around the Thorlabs cage system, individual subsystems can be swapped or reconfigured to suit different experimental needs. The architecture supports interchangeable objectives for trading off between resolution and field of view, making it adaptable for applications ranging from coarse alignment scans to high-resolution nanofabrication.

Key Capabilities

  • Sub-micrometer feature sizes down to 612 nm with the 40× objective configuration
  • Sub-50 nm positioning precision through 15 µrad galvanometer step resolution
  • ~1 mm² patterning area with the 10× objective for large-area work
  • Real-time dose control via acousto-optic modulator synchronized with scan trajectory
  • Vectorized scan paths for efficient curvilinear patterning without raster artifacts

Applications

The system enables direct-write lithography on photoresist-coated substrates for diffractive optical elements, photonic crystals, and micro-lens arrays. It supports two-photon polymerization for 3D nanostructure fabrication, surface micro-structuring through laser ablation, and fundamental studies of ultrafast laser–material interactions including damage threshold measurements and laser-induced periodic surface structures.

Cost & Performance

ConfigurationSpot SizeField of ViewStep Resolution
40× (NA 0.65)612 nm0.40 mm40.5 nm
20× (NA 0.40)1.07 µm0.80 mm81 nm
10× (NA 0.25)2.15 µm1.6 mm162 nm

Total system cost: ~$13,300 USD, an order of magnitude less than comparable commercial platforms.

Technical Documentation

Lithography_System_Overview.pdf

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Last updated on February 7, 2026 at 11:10 PM UTC+7. See Changelog

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